发明名称 ATOMIC LAYER DEPOSITION APPARATUS TO DETECT DEFORMATION OF SUSCEPTOR
摘要 PURPOSE: An atomic layer deposition apparatus for detecting the deformation of susceptor is provided to detect the deformation of susceptor and predict the life span of susceptor, by frequently inspecting the susceptor at the time of the loading and unloading of substrate. CONSTITUTION: An atomic layer deposition apparatus for detecting the deformation of susceptor includes a susceptor(20), a transfer module(40), and a sensor. The susceptor receives numerous substrates. The transfer module transfers the substrate to the susceptor. The sensor is provided in the transfer module, and measures the horizontality of susceptor surface.
申请公布号 KR20130065014(A) 申请公布日期 2013.06.19
申请号 KR20110131690 申请日期 2011.12.09
申请人 K.C.TECH CO., LTD. 发明人 KANG, HYUN
分类号 C23C16/448;G01B11/26;H01L21/205 主分类号 C23C16/448
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