| 摘要 |
PROBLEM TO BE SOLVED: To stably supply a liquid developer to a substrate when developing the substrate after being coated with resist and exposed. SOLUTION: Liquid developer nozzles are properly used corresponding to processing by executing: a process of supplying the liquid developer from a first liquid developer nozzle in a belt shape to one of a center part and a peripheral edge part on the surface of a substrate so as to turn one end side of the belt-like area to the center of the substrate, while rotating the substrate around a vertical axis through a substrate holding part which holds the substrate, moving the supply position of the liquid developer, and thus forming a liquid film of the liquid developer on the surface of the substrate; and a process of supplying the liquid developer from a second liquid developer nozzle in a circular shape or in a belt shape shorter than the liquid developer supplied from the first liquid developer nozzle to the center part of the substrate in order to prevent drying of the liquid film of the liquid developer, rotating the substrate around the vertical axis through the substrate holding part, and extending the liquid developer to the peripheral edge part of the substrate by centrifugal force. COPYRIGHT: (C)2012,JPO&INPIT |
