| 摘要 |
A method for fabricating a display device having a thin film transistor. When forming wirings and electrode patterns made of a metal layer on a mother substrate, the metal wiring and the electrode patterns are patterned and, simultaneously, the metal layer within a predetermined range of the outermost region of the mother substrate is removed. Removing the metal layer in the outermost region of the mother substrate when patterning the metal layer may obtain stability in the process of fabricating the display device and lower a device failure rate, thereby increasing productivity.
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