发明名称 FIELD-EFFECT TRANSISTOR USING N-DOPED GRAPHENE AND PREPARING METHOD OF THE SAME
摘要 PURPOSE: A field effect transistor using N-doped graphene and a manufacturing method thereof are provided to reduce an off current and maintain a high charge mobility by doping graphene with inorganic materials. CONSTITUTION: An oxide layer(200) is formed on a base material(100). A source electrode(300) and a drain electrode(400) are formed on both sides of the oxide layer. A channel layer(500) is electrically connected to the source electrode and the drain electrode. The channel layer includes N-doped graphene by inorganic materials(600). The inorganic materials include nanoparticles of metal, metal oxide, metal sulfide, and metal halide. The size of the inorganic material is 1 to 100 nm.
申请公布号 KR101275282(B1) 申请公布日期 2013.06.18
申请号 KR20110090645 申请日期 2011.09.07
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分类号 H01L21/336;H01L29/78 主分类号 H01L21/336
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