发明名称 THE PLANAR GATE IGBT WITH NMOS
摘要 <p>PURPOSE: A planar gate IGBT with an nMOS is provided to improve the efficiency of electron injections by inserting an nMOS into a planar gate. CONSTITUTION: A P+ collector region(20) is positioned on the lower part of an N drift layer(10). An N+ region(40) is positioned in the lower sides of the N drift layer. A first emitter electrode(50) is positioned on the upper sides of the N drift layer. A planar gate electrode(60) is positioned between the upper part of the N drift layer and the first emitter electrode. A second emitter electrode(70) is positioned between the planar gate electrodes.</p>
申请公布号 KR20130064555(A) 申请公布日期 2013.06.18
申请号 KR20110131223 申请日期 2011.12.08
申请人 SOGANG UNIVERSITY RESEARCH FOUNDATION 发明人 KIM, KWANG SOO;KOO, YONG SEO
分类号 H01L29/78;H01L21/336 主分类号 H01L29/78
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