发明名称 |
THE PLANAR GATE IGBT WITH NMOS |
摘要 |
<p>PURPOSE: A planar gate IGBT with an nMOS is provided to improve the efficiency of electron injections by inserting an nMOS into a planar gate. CONSTITUTION: A P+ collector region(20) is positioned on the lower part of an N drift layer(10). An N+ region(40) is positioned in the lower sides of the N drift layer. A first emitter electrode(50) is positioned on the upper sides of the N drift layer. A planar gate electrode(60) is positioned between the upper part of the N drift layer and the first emitter electrode. A second emitter electrode(70) is positioned between the planar gate electrodes.</p> |
申请公布号 |
KR20130064555(A) |
申请公布日期 |
2013.06.18 |
申请号 |
KR20110131223 |
申请日期 |
2011.12.08 |
申请人 |
SOGANG UNIVERSITY RESEARCH FOUNDATION |
发明人 |
KIM, KWANG SOO;KOO, YONG SEO |
分类号 |
H01L29/78;H01L21/336 |
主分类号 |
H01L29/78 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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