发明名称 |
Process of localized electrografting onto photosensitive semiconductor substrates |
摘要 |
A process for preparing an organic film on a selected zone at the surface of a photosensitive semiconductor substrate, including (i) bringing a liquid solution which includes at least one organic adhesion primer into contact with at least the selected zone; (ii) polarizing the surface of the substrate to an electric potential more cathodic than the reduction potential of the organic adhesion primer; and (iii) exposing the selected zone to light radiation, the energy of which is at least equal to that of the band gap of the photosensitive semiconductor substrate.
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申请公布号 |
US8466072(B2) |
申请公布日期 |
2013.06.18 |
申请号 |
US20080678993 |
申请日期 |
2008.09.18 |
申请人 |
CHARLIER JULIENNE;PALACIN SERGE;COMMISSARIAT A L'ENERGIE ATOMIQUE ET AUX ENERGIESALTERNATIVES |
发明人 |
CHARLIER JULIENNE;PALACIN SERGE |
分类号 |
H01L21/31;H01L21/469 |
主分类号 |
H01L21/31 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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