发明名称 Process of localized electrografting onto photosensitive semiconductor substrates
摘要 A process for preparing an organic film on a selected zone at the surface of a photosensitive semiconductor substrate, including (i) bringing a liquid solution which includes at least one organic adhesion primer into contact with at least the selected zone; (ii) polarizing the surface of the substrate to an electric potential more cathodic than the reduction potential of the organic adhesion primer; and (iii) exposing the selected zone to light radiation, the energy of which is at least equal to that of the band gap of the photosensitive semiconductor substrate.
申请公布号 US8466072(B2) 申请公布日期 2013.06.18
申请号 US20080678993 申请日期 2008.09.18
申请人 CHARLIER JULIENNE;PALACIN SERGE;COMMISSARIAT A L'ENERGIE ATOMIQUE ET AUX ENERGIESALTERNATIVES 发明人 CHARLIER JULIENNE;PALACIN SERGE
分类号 H01L21/31;H01L21/469 主分类号 H01L21/31
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