| 摘要 |
PURPOSE: A roll to roll patterning system and a patterning method using the same are provided to monitor an ashing process in real time, thereby reducing a failure. CONSTITUTION: A resist forming unit(110) forms an etch resist pattern and a mark pattern with a plurality of steps on a base layer(10) which moves by a roll unit. An etching unit(120) uses the etch resist pattern to etch a layer on the base layer. An ashing unit(130) ashes the etch resist pattern and the mark pattern. A measurement unit(150a,150b) is arranged in at least one side of the ashing unit, and measures a shape of the mark pattern. |
