发明名称 SUBSTRATE MOUNTING MECHANISM AND SUBSTRATE PROCESSING APPARATUS USING SAME
摘要 A substrate mounting mechanism includes a substrate mounting table for mounting a substrate thereon; a heat source for supplying a heat or a cold heat to the substrate via the substrate mounting table; a substrate elevating member movable, having a substrate-supporting portion for supporting an end portion of the substrate, the substrate elevating member being upwardly and downwardly between a first position at which the substrate is mounted on the substrate mounting table and a second position that is located above the first position; and an elevating unit for upwardly and downwardly moving the substrate elevating member. The substrate elevating member serves as a part of the substrate mounting table at the first position.
申请公布号 KR101274890(B1) 申请公布日期 2013.06.17
申请号 KR20130012236 申请日期 2013.02.04
申请人 发明人
分类号 B65G49/07;G02F1/13;H01L21/677;H01L21/683 主分类号 B65G49/07
代理机构 代理人
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