| 摘要 |
PURPOSE: A dry plating device is provided to improve productivity by using an ion cleaning, a heating, and a sputtering and to clean rollers for an alloyed body by using an ion beam when plating chrome(Cr) and CrN to a dry plating method inside a vacuum chamber. CONSTITUTION: A dry plating device comprises a target(11) for a plated body, a roller(12) for an alloyed body, a revolution jig(13), a rotation jig(14), an ion gun(15),and a first cathode power supply unit(16-1) and a first bias power supply unit(16-2). The target for the plated body is installed to be in accord with a central axis of a longitudinal direction within a chamber. The roller for the alloyed body surrounds the target for the plated body side by side with being corresponded in a longitudinal direction. Ions for plating respectively load the alloyed body sputtered by plasma. The revolution jig revolves the rollers for the alloyed body around the target for the plated body. The rotation jig rotates the rollers for the alloyed body on a central axis of the rollers for the alloyed body. The ion gun is installed at a circumference of an inner side wall around of a chamber, and fires an ion beam to the roller for the alloyed body. The first cathode power supply unit supplies an electrode voltage to the target for the plated body. The first bias power supply unit supplies a first bias voltage to the roller for the alloyed body.
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