| 摘要 |
A substrate heating apparatus is provided to minimize the standby time of a substrate between a baking process and a previous process by continuously performing the baking process and the previous process, thereby shortening a process time. Upper and lower plates(114,116) serve as a ceiling and a floor, respectively. A front plate(118) and a rear plate(120) connect edges of the upper and lower plates to define an internal space for receiving a substrate. An inlet port(132) is formed on a lower portion of the front plate, and an outlet port(134) is formed on an upper portion of the rear plate. Movable small-sized ovens(142a to 142e) are arranged in parallel with each other, and are moved in all directions, in which the substrate is mounted in the small-sized oven. |
