| 摘要 |
Provided is a method of enhancing an optical metrology system comprising a metrology tool and an optical metrology model. The optical metrology model includes a model of the metrology tool and a profile model of the sample structure. A first library comprising Jones and/or Mueller matrices or components (JMMOC) is generated using ray tracing based on a representative ray. A difference library is generated comprising difference JMMOC for each ray of the set of rays, calculated using the difference from the representative JMMOC. During profile extraction, the JMMOC of the representative ray and each ray of the set of rays are regenerated using the first and difference libraries and a best match simulated diffraction signal is obtained using the regenerated JMMOC of the representative ray, regenerated JMMOC of the rays, and the optical metrology model to determine profile parameters of the sample structure. |
