3-DIMENSIONAL IMAGE ACQUISITION SYSTEM FOR MASK PATTERN INSPECTION AND METHOD THEREOF

摘要

PURPOSE: A 3-dimensional image acquisition system for mask pattern inspection and a method thereof are provided to effectively detect micro defects generated in a 3D mask pattern due to an extreme ultraviolet light source. CONSTITUTION: A first and a second optical source part(100a,100b) radiate first and second extreme ultraviolet. A first and a second concave mirror(200a,200b) condense the extreme ultraviolet radiated from the first and the second optical source part. A first and a second back mirror(300a,300b) reflect the condensed extreme ultraviolet to a measurement target mask. A first and a second CCD camera(600a,600b) records the diffraction beam information of the measurement target mask(10). The measurement target mask is mounted on a stage(400). A transfer unit(500) moves the stage in the X-axis and the Y-axis direction. [Reference numerals] (700) Control device;