ROTATABLE SPUTTER TARGET

摘要

A target arrangement for providing material to be deposited on a substrate is provided. The target arrangement includes a target part (210) made of the material to be deposited. The target part may substantially have the shape of a hollow cylinder having an inner (260) and an outer (250) diameter, wherein the hollow cylinder includes a cylindrical surface (211) and two face surfaces (212). The target arrangement may further include a connection arrangement comprising a recess (230) within at least one of the face surfaces of target part. Also, a deposition apparatus including the target arrangement and a method for mounting a target arrangement in a deposition chamber are described.