发明名称 METHOD OF MANUFACTURING A CYLINDRICAL TARGET FOR A SPUTTER
摘要 PURPOSE: A method for manufacturing a cylindrical sputtering target is provided to manufacture a cylindrical target at low temperatures and improved productivity. CONSTITUTION: A method for manufacturing a cylindrical sputtering target comprises the steps of: preparing metal billets(10), mounting the metal billets in an extrusion die(100), and pressing the metal billets with a mandrel and a press to extrude a cylindrical target from the inlet of the extrusion die.
申请公布号 KR101273096(B1) 申请公布日期 2013.06.13
申请号 KR20110038922 申请日期 2011.04.26
申请人 发明人
分类号 B21C23/14;B21C23/32;B21C29/00;B21C31/00 主分类号 B21C23/14
代理机构 代理人
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