发明名称 Structure for Reducing Integrated Circuit Corner Peeling
摘要 A crack prevention structure that reduces integrated circuit corner peeling and reduces cracking is disclosed. The crack prevention structure comprises a semiconductor substrate; a first plurality of dielectric layers of a first material disposed over the semiconductor substrate; a second plurality of dielectric layers of a second material different than the first material, disposed on the first plurality of dielectric layers, wherein the first plurality of dielectric layers and the second plurality of dielectric layers meet at an interface; and a plurality of metal structures and a plurality of via structures formed through the interface of the first plurality of dielectric layers and the second plurality of dielectric layers.
申请公布号 US2013147018(A1) 申请公布日期 2013.06.13
申请号 US201313764478 申请日期 2013.02.11
申请人 MANUFACTURING COMPANY, LTD. TAIWAN SEMICONDUCTOR;TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. 发明人 CHEN HSIEN-WEI;LIU YU-WEN;TSAI HAO-YI
分类号 H01L23/498;H01L21/78 主分类号 H01L23/498
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