发明名称 |
CHARGED PARTICLE BEAM WRITING APPARATUS AND CHARGED PARTICLE BEAM WRITING METHOD |
摘要 |
Provided is a charged particle beam writing apparatus including a stage which a sample can be mounted thereon, an irradiation unit which emits a charged particle beam to be irradiated on the sample, and an aperture plate which includes a first opening portion to shape the charged particle beam. The aperture plate has a stacked structure of a first member and a second member, and a position of an end portion of the first opening portion in the second member is recessed from the position of the end portion of the first opening portion in the first member. |
申请公布号 |
US2013149646(A1) |
申请公布日期 |
2013.06.13 |
申请号 |
US201213706903 |
申请日期 |
2012.12.06 |
申请人 |
NUFLARE TECHNOLOGY, INC.;NUFLARE TECHNOLOGY, INC. |
发明人 |
TOUYA TAKANAO;OGASAWARA MUNEHIRO |
分类号 |
G21K5/08 |
主分类号 |
G21K5/08 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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