| 摘要 |
<P>PROBLEM TO BE SOLVED: To form an oscillation beam having high tension for a thick oscillation beam. <P>SOLUTION: A manufacturing method of an oscillatory transducer includes a counter clearance forming step (1) for forming a counter clearance through etching in a silicon layer on one side of an SOI substrate, an impurity diffusion source layer forming step (2) of forming an impurity diffusion source layer which imparts stress of tension to an oscillation beam on the one side of the SOI substrate and a surface of the counter clearance, an impurity diffusion layer forming step (3) of forming an impurity diffusion layer by diffusing impurities of the impurity diffusion source layer over a silicon layer on the one side through heat treatment, and an oscillation beam etching forming step (4) of forming the oscillation beam by performing etching on the impurity diffusion source layer and a silicon oxide of the SOI substrate in the same process or performing etching on the impurity diffusion source layer and the silicon oxide of the SOI substrate successively in other processes. <P>COPYRIGHT: (C)2013,JPO&INPIT |
