| 摘要 |
<p>PURPOSE: A substrate processing apparatus and a substrate processing method are provided to quickly cool a heated substrate and transfer the substrate, and to prevent overbake without a cooling apparatus. CONSTITUTION: Heat treatment parts(PEB1-PEB3) perform a thermal process on a substrate(W). Cooling treatment parts(CP1-CP6) perform a cooling process on the substrate. A substrate transfer part(20) moves the substrate between the heat treatment part and the cooling treatment part. An indexer(10) moves the substrate processed by a developing process to the outside. The indexer includes a mounting table(11) for a series of carriers(C) and an indexer robot(12) for placing the processed substrate to each carrier.</p> |
