发明名称 |
SYSTEMS AND METHODS PROVIDING ELECTRON BEAM WRITING TO A MEDIUM |
摘要 |
A method for electron-beam writing to a medium includes positioning the medium within an e-beam writing machine so that the medium is supported by a stage and is exposed to an e-beam source. The method also includes writing a pattern to the medium using a plurality of independently-controllable beams of the e-beam source, in which the pattern comprises a plurality of parallel strips. Each of the parallel strips is written using multiple ones of the independently-controllable beams.
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申请公布号 |
US2013146780(A1) |
申请公布日期 |
2013.06.13 |
申请号 |
US201313757494 |
申请日期 |
2013.02.01 |
申请人 |
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.;TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. |
发明人 |
WANG WEN-CHUAN;LIN SHY-JAY;SHIN JAW-JUNG;LIN BURN JENG |
分类号 |
H01J37/317;H01J37/30 |
主分类号 |
H01J37/317 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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