| 摘要 |
A manufacturing method of a thin film transistor array substrate includes the following two steps: depositing a first metal layer on a substrate; and processing the first metal layer through coating photoresist, exposing, developing, etching, and stripping photoresist processes to form a light blocking metal portion and a lower electrode of a first storage capacitor simultaneously. With the manufacturing method of the present disclosure, the light blocking metal portion can protect components of TFTs from being exposed to strong light during the manufacturing process, which can improve a stability of the TFT.
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