| 摘要 |
<P>PROBLEM TO BE SOLVED: To suppress a decrease in availability of a charged particle beam lithography device. <P>SOLUTION: The charged particle beam lithography device is provided with means of performing proximity effect correction operation of an external processing device and shot division in advance, and then generating shot order correction value data in which proximity effect correction values by shots are arranged in order based upon shot division data and a result of the proximity effect correction operation. <P>COPYRIGHT: (C)2013,JPO&INPIT |
