发明名称 METHOD OF FORMING MAGNETIC PATTERN LAYER AND MAGNETIC PATTERN LAYER MANUFACTURED THEREBY
摘要 <p>The present invention provides a method of forming a magnetic pattern layer and a magnetic pattern layer manufactured thereby. The method of forming a magnetic pattern layer includes: a step of disposing a mask having a predetermined pattern on a nonmagnetic layer that has magnetism when reduced; and a step of irradiating hydrogen ions onto the nonmagnetic layer on which the mask is disposed. A portion corresponding to the mask pattern on the nonmagnetic layer is reduced by the irradiated hydrogen ions, and the periphery of a reduced region is partially reduced.</p>
申请公布号 WO2013085094(A1) 申请公布日期 2013.06.13
申请号 WO2011KR10016 申请日期 2011.12.23
申请人 INDUSTRY-ACADEMIC COOPERATION FOUNDATION, YONSEI UNIVERSITY;HONG, JONGILL;KIM, SANGHOON 发明人 HONG, JONGILL;KIM, SANGHOON
分类号 G11B5/62 主分类号 G11B5/62
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