发明名称 |
Silicon thin film solar cell manufacturing method and the Silicon thin film solar cell manufactured using the method |
摘要 |
PURPOSE: A method for manufacturing a silicon thin film solar cell and the silicon thin film solar cell manufactured by the method are provided to reduce reflectivity by forming an aluminum oxide layer between a transparent substrate and an electrode layer. CONSTITUTION: An aluminum oxide layer is formed in a transparent substrate(S2). A first electrode layer is formed on the aluminum oxide layer(S3). A first antireflection layer is formed on the first electrode layer(S4). A silicon layer is formed on the first antireflection layer(S6). A second electrode layer is formed on the silicon layer(S8). [Reference numerals] (AA) Start; (BB) End; (S1) Prepare a substrate; (S2) Form an aluminum oxide layer; (S3) Form a first electrode layer; (S4) Form a first antireflection layer; (S5) Form a protective layer; (S6) Form a silicon layer; (S7) Form a second antireflection layer; (S8) Form a second electrode layer |
申请公布号 |
KR101274336(B1) |
申请公布日期 |
2013.06.13 |
申请号 |
KR20110123709 |
申请日期 |
2011.11.24 |
申请人 |
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发明人 |
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分类号 |
H01L31/0445;H01L31/042;H01L31/075;H01L31/18 |
主分类号 |
H01L31/0445 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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