PROCESS KIT AND TARGET FOR SUBSTRATE PROCESSING CHAMBER

摘要

PURPOSE: A process kit and a target for a substrate processing chamber are provided to reduce the deposition of a process deposit on a process chamber and the protrusion edge of a substrate by using a ring assembly arranged around a substrate support part. CONSTITUTION: A substrate support part(130) holds a substrate. A deposition ring(208) includes a circumference recess pocket having a holding post(278). The holding post includes an elevation-prevention bracket(270) and a constraint beam. The constraint beam is mounted on the back surface of the substrate support part to hold the elevation-protection bracket. The elevation-protection bracket includes a block(290) including a penetration-channel(294) and a maintenance hoop(298) adhered to the block.