| 摘要 |
<p>PURPOSE: A CIGS layer forming apparatus is provided to uniformly process a substrate by forcedly circulating the atmospheric gas of a chamber in a vertical direction. CONSTITUTION: A wall(110) provides a chamber to load and process a plurality of substrates which are erected with a constant interval. A door(120) is installed on the lower side of the wall and opens and closes the chamber. A blowing unit(151) is installed in the door and vertically circulates the atmospheric gas of the chamber.</p> |
