| 发明名称 |
CATALYTIC ARCHITECTURE WITH HIGH S/V RATIO, LOW DP AND HIGH VOID FRACTION FOR INDUSTRIAL APPLICATIONS |
| 摘要 |
<p>Catalytic substrate characterized in that it possesses an architecture, which develops a Geometric Surface Area (GSA) greater than 5,000m2/m3 and a Percent of Void Fraction (PVF) greater than 80%; Catalytic composition comprising it; its preparation process and its use as a catalyst in synthesis gas processes.</p> |
| 申请公布号 |
WO2013083373(A1) |
申请公布日期 |
2013.06.13 |
| 申请号 |
WO2012EP72591 |
申请日期 |
2012.11.14 |
| 申请人 |
L'AIR LIQUIDE, SOCIETE ANONYME POUR L'ETUDE ET L'EXPLOITATION DES PROCEDES GEORGES CLAUDE |
发明人 |
CORNILLAC, MATHIEU;DEL-GALLO, PASCAL;GARY, DANIEL;HAEGELE, CHRISTIAN |
| 分类号 |
B01J35/04;B01J35/10 |
主分类号 |
B01J35/04 |
| 代理机构 |
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代理人 |
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| 主权项 |
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| 地址 |
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