发明名称 METHOD OF FABRICATING A SOLAR CELL
摘要 A solar cell and a fabricating method thereof are provided. In the method of fabricating the solar cell, a p-type semiconductor substrate on whose light-receiving surface an anti-reflection coating is formed is loaded into a processing chamber. In this case, the p-type semiconductor substrate may be loaded on a substrate support of an apparatus of processing a plurality of substrates along the circumference of the substrate support, in the state where the back surface of the p-type semiconductor substrate faces upward. Then, a back surface field (BSF) layer having the characteristic of Negative Fixed Charge (NFC) is formed with AlO, AN or ALON on the back surface of the p-type semiconductor substrate. At this time, the BSF layer may be formed by simultaneously injecting an Al source gas, a first purge gas, an oxidizing agent gas and/or a ntiriding agent gas, and a second purge gas through injection holes of individual gas injection units while relatively rotating the substrate support with respect to the shower head. Thereafter, a back surface electrode is formed on the BSF layer such that the back surface electrode is electrically connected to the BSF layer.
申请公布号 US2013149808(A1) 申请公布日期 2013.06.13
申请号 US201313743920 申请日期 2013.01.17
申请人 WONIK IPS CO., LTD.;WONIK IPS CO., LTD. 发明人 PARK SANG-JOON;PARK SEONG-BEOM;KIM YOUNG-JUN;BAE JUN-SUNG
分类号 H01L31/0232 主分类号 H01L31/0232
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