发明名称 Semiconductor Device and Method of Forming Adjacent Channel and Dam Material Around Die Attach Area of Substrate to Control Outward Flow of Underfill Material
摘要 A semiconductor device has a flipchip or PoP semiconductor die mounted to a die attach area interior to a substrate. The substrate has a contact pad area around the die attach area and flow control area between the die attach area and contact pad area. A first channel is formed in a surface of the substrate within the flow control area. The first channel extends around a periphery of the die attach area. A first dam material is formed adjacent to the first channel within the flow control area. An underfill material is deposited between the die and substrate. The first channel and first dam material control outward flow of the underfill material to prevent excess underfill material from covering the contact pad area. A second channel can be formed adjacent to the first dam material. A second dam material can be formed adjacent to the first channel.
申请公布号 US2013147065(A1) 申请公布日期 2013.06.13
申请号 US201313760187 申请日期 2013.02.06
申请人 STATS CHIPPAC, LTD.;STATS CHIPPAC, LTD. 发明人 LEE KYUNGHOON;JANG KIYOUN;KIM JOONDONG
分类号 H01L23/498;H01L21/50 主分类号 H01L23/498
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