COMPLEX OXIDE SINTERED BODY, SPUTTERING TARGET, TRANSPARENT CONDUCTIVE OXIDE FILM, AND METHOD FOR PRODUCING SAME

摘要

The present invention provides a complex oxide sintered body (10) wherein if indium, zirconium and yttrium are respectively In, Zr and Y, Zr/(In + Zr + Y) is 0.05-4.5 at% and Y/(In + Zr + Y) is 0.005-0.5 at%. The present invention also provides a sputtering target which is formed of the complex oxide sintered body (10) and a transparent conductive oxide film which is obtained by sputtering the sputtering target.