MEMS device formed inside hermetic chamber having getter film
摘要
<p>A MEMS device including a getter film formed inside a hermetic chamber provides stable performance of the MEMS device by electrically stabilizing the getter film. The MEMS device 100 includes a movable portion and a fixed portion formed inside the hermetic chamber. The hermetic chamber is formed by a base material 10 of the MEMS device 100 and glass substrates 30 and 32 having a cavity 34 and cavities 36a through 36f made therein. A part 40c of any continuous getter film 40 formed inside the hermetic chamber connects to only one of any one or a plurality of predetermined electrical potentials of the fixed portion and a ground potential of the fixed portion through the base material of the MEMS device 100.</p>
