| 摘要 |
<p>An apparatus is provided for treating an exhaust gas stream 22 from an upstream processing apparatus. A plasma abatement device 10 has a reaction chamber 14 and a plasma torch 12 for generating a plasma stream for injection into the chamber for treating the gas stream 22. A first inlet 18 conveys a gas stream into the plasma abatement device for treatment, and a second inlet 20, in a normal condition of the apparatus, is in flow communication with a source of reagent for conveying reagent 24 into the plasma device. This reagent improves the efficiency of the treatment. In a back-up condition of the apparatus, the second inlet 20 is in flow communication with an exhaust gas stream source for conveying a gas stream into the device for treatment. This may be the same source that is in communication with first inlet 18 or a separate source from a separate processing apparatus. This allows continual use of the abatement device when the inlet18 become blocked due to debris and contamination. It also ensures that the upstream processing device does not have to be taken off-line whilst the abatement device is replaced or the blockage removed.</p> |
