发明名称 Illumination optics for a micro lithographic projection illumination system
摘要 <p>The device has an illuminating light (3) of a light source (2) and an optical assembly group (28) for adjustment of an illumination setting in a pupil level (12) of the illuminating lens. Another optical assembly group (29) separated from former optical assembly group for adjustment of another illumination setting in the pupil level of the illuminating lens. A linking component (35) arranged in the optical path after both optical assembly groups supplies the illuminating light, which has passed the former assembly group or the latter optical assembly group, to the illuminating field. Independent claims are also included for the following: (1) an illumination system with an illuminating lens (2) a method for micro-lithographic production of micro-structured elements (3) an extension module for illuminating lens.</p>
申请公布号 EP1879071(B1) 申请公布日期 2013.06.12
申请号 EP20070013477 申请日期 2007.07.10
申请人 CARL ZEISS SMT GMBH 发明人 KOHL, ALEXANDER, DR.
分类号 G03F7/20 主分类号 G03F7/20
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