| 发明名称 |
LARGE SUBSTRATE, AND POLISHING METHOD OF LARGE SUBSTRATE FOR UNIFORM POLISHING |
| 摘要 |
<p>Disclosed is a substrate polishing method capable of minimizing a difference of polishing amounts between a center portion and a rim portion of a large scale plate during a plate polishing process.</p> |
| 申请公布号 |
EP2602057(A2) |
申请公布日期 |
2013.06.12 |
| 申请号 |
EP20110814815 |
申请日期 |
2011.08.01 |
| 申请人 |
LG CHEM, LTD. |
发明人 |
MIN, KYOUNG-HOON;IM, YE-HOON;LEE, DAE-YEON;SONG, JAE-IK;PARK, SU-CHAN |
| 分类号 |
B24B1/00;B24B7/20;B24B49/00;H01L21/304 |
主分类号 |
B24B1/00 |
| 代理机构 |
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代理人 |
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| 主权项 |
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| 地址 |
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