| 发明名称 |
Catalytic architecture with high S/V ratio, low DP and high void fraction for industrial applications |
| 摘要 |
<p>Catalytic substrate characterized in that it possesses an architecture, which develops a Geometric Surface Area (GSA) greater than 5,000m 2 /m 3 and a Percent of Void Fraction (PVF) greater than 80%; Catalytic composition comprising it; its preparation process and its use as a catalyst in synthesis gas processes.</p> |
| 申请公布号 |
EP2602024(A1) |
申请公布日期 |
2013.06.12 |
| 申请号 |
EP20110306628 |
申请日期 |
2011.12.08 |
| 申请人 |
L'AIR LIQUIDE SOCIETE ANONYME POUR L'ETUDE ET L'EXPLOITATION DES PROCEDES GEORGES CLAUDE |
发明人 |
DEL-GALLO, PASCAL;GARY, DANIEL;CORNILLAC, MATHIEU;HAEGELE, CHRISTIAN |
| 分类号 |
B01J35/04;B01J35/10 |
主分类号 |
B01J35/04 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
|
| 地址 |
|
