| 摘要 |
PURPOSE: A device for processing a substrate is provided to process a large scale substrate and to obtain high processing rate. CONSTITUTION: A device for processing a substrate comprises a laser generator(1), a reflector(2), a reflecting module(3), a first optical path converting module(4), a first simulated module(5), and a transfer stage(9). The device for processing a substrate processes the substrate by irradiating laser to the substrate. A laser beam is reflected to the reflector and the reflecting module and a processing route is changed. The laser beam processes to the first optical path converting module. When a first irradiating module transfers, the reflecting module transfers together and processing distance is always fixed. |
