发明名称 |
Coating structure and method for forming the same |
摘要 |
<p>The invention provides a coating structure and a method for forming the same where, by forming an aluminium oxide layer and a silicon dioxide layer between a product to be coated and a coating layer, durability, reliability and anti-corrosion of the coating layer can be improved and furthermore, product yield can also be improved. The coating structure formed on the surface of a product includes an aluminium oxide (Al 2 O 3 ) layer formed on the surface of the product, a silicon dioxide (SiO 2 ) layer formed on the surface of the aluminium oxide (Al 2 O 3 ) layer, and a coating composition layer formed on the silicon dioxide (SiO 2 ) layer.</p> |
申请公布号 |
EP2602293(A1) |
申请公布日期 |
2013.06.12 |
申请号 |
EP20120161042 |
申请日期 |
2012.03.23 |
申请人 |
SAMSUNG ELECTRONICS CO., LTD. |
发明人 |
PARK, BYUNG HA;CHO, SANG HO;KIM, MYUNG GON;SONG, KI YONG;HAM, CHEOL;HWANG, IN OH |
分类号 |
C09D183/04;B05D5/00;C23C14/08;C23C14/10 |
主分类号 |
C09D183/04 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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