SPIN PROCESSER AND SPIN PROCESSING METHOD

摘要

PURPOSE: A spin processing apparatus and a spin processing method are provided to uniformly treat a substrate by using an elevating device for raising a substrate support member. CONSTITUTION: At least three substrate support members(4f) support the edge part of a substrate. At least three clamp pins(21) rotate eccentrically to the rotational direction of a rotator. The clamp pin holds the substrate. An elevating device raises a substrate support member. A rotation device eccentrically rotates the clamp pin.