发明名称 Method and apparatus of forming bipolar transistor device
摘要 The present disclosure provides a semiconductor device having a transistor. The transistor includes a substrate. The transistor includes a collector region that is formed in a portion of the substrate. The transistor includes a base region that is surrounded by the collector region. The transistor includes an emitter region that is surrounded by the based region. The transistor includes an isolation structure that is disposed adjacent the emitter region. The transistor includes a gate structure that is disposed over a portion of the emitter region and a portion of the isolation structure.
申请公布号 US8461621(B2) 申请公布日期 2013.06.11
申请号 US20100720504 申请日期 2010.03.09
申请人 CHUANG HARRY HAK-LAY;TEO LEE-WEE;ZHU MING;TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. 发明人 CHUANG HARRY HAK-LAY;TEO LEE-WEE;ZHU MING
分类号 H01L27/06;H01L21/8249 主分类号 H01L27/06
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