JIG FOR USING ETCHING, AND CHEMICAL LIFT OFF APPARATUS COMPRISING THE SAME
摘要
PURPOSE: An etching jig and a chemical lift-off apparatus including the same are provided to improve throughput by preventing etching in an unnecessary region. CONSTITUTION: A frame body receives a semiconductor structure(10). An etching hole(121) is formed in an upper part of the frame body. The frame body exposes the upper part of a substrate. A sealing member(150) is arranged in the frame body. The sealing member encapsulates a semiconductor thin film and a support layer.
申请公布号
KR20130061513(A)
申请公布日期
2013.06.11
申请号
KR20110127862
申请日期
2011.12.01
申请人
SAMSUNG ELECTRONICS CO., LTD.
发明人
CHAE, SU HEE;KIM, JUN YOUN;PARK, YOUNG SOO;LEE, JAE WON;TAK, YOUNG JO;HONG, HYUN GI