Lithographic apparatus and device manufacturing method,申请号US20100818724-传众专利搜索

发明名称	Lithographic apparatus and device manufacturing method
摘要	An immersion lithographic apparatus comprising a surface which is curved such that a surface-tension drainage force acts in a direction on a film of immersion liquid on the surface.
申请公布号	US8462313(B2)	申请公布日期	2013.06.11
申请号	US20100818724	申请日期	2010.06.18
申请人	JACOBS JOHANNES HENRICUS WILHELMUS;JANSEN HANS;BRUIJSTENS JEROEN PETER JOHANNES;THOMAS IVO ADAM JOHANNES;KUSTERS GERARDUS ADRIANUS ANTONIUS MARIA;MIRANDA MARCIO ALEXANDRE CANO;TANASA GHEORGHE;ASML NETHERLANDS B.V.	发明人	JACOBS JOHANNES HENRICUS WILHELMUS;JANSEN HANS;BRUIJSTENS JEROEN PETER JOHANNES;THOMAS IVO ADAM JOHANNES;KUSTERS GERARDUS ADRIANUS ANTONIUS MARIA;MIRANDA MARCIO ALEXANDRE CANO;TANASA GHEORGHE
分类号	G03B27/42;G03B27/52	主分类号	G03B27/42
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