发明名称 System and method for improved automated semiconductor wafer manufacturing
摘要 System and method for automated semiconductor manufacturing is provided. In accordance with one aspect of the present invention, a system for automated semiconductor wafer manufacturing includes a smart overlay control (SOC) database having empirical alignment data related to overlay alignment, and a simulation module communicatively coupled to the SOC database, the simulation module determining a simulated overlay alignment of a wafer on the plurality of photolithography tools in a tool bank based on the empirical alignment data stored in the SOC database. The system also includes a dispatch module communicatively coupled to the SOC database and the simulation module, the dispatch module controlling the dispatch of a wafer to one of a plurality of photolithography tools in a tool bank based at least in part on the simulated overlay alignment.
申请公布号 US8463419(B2) 申请公布日期 2013.06.11
申请号 US20090617380 申请日期 2009.11.12
申请人 HSIEH WEN-YAO;CHIU CHE-YU;PENG ANWEI;CHEN JIAN-HUNG;WU HSUEH-CHEN;TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. 发明人 HSIEH WEN-YAO;CHIU CHE-YU;PENG ANWEI;CHEN JIAN-HUNG;WU HSUEH-CHEN
分类号 G06F19/00 主分类号 G06F19/00
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