发明名称 Illumination optical system, exposure apparatus, and device manufacturing method
摘要 An illumination optical system for illuminating an irradiated plane M with illumination light provided from a light source includes a spatial light modulator, which is arranged in an optical path of the illumination optical system and forms a desired light intensity distribution at a pupil position of the illumination optical system or a position optically conjugated with the pupil position, and a diffuser, which is arranged at an incidence side of the spatial light modulator through which the illumination light enters.
申请公布号 US8462317(B2) 申请公布日期 2013.06.11
申请号 US20080252283 申请日期 2008.10.15
申请人 TANAKA HIROHISA;NIKON CORPORATION 发明人 TANAKA HIROHISA
分类号 G02B5/02;G03B27/32;G03B27/42;G03B27/54;G03B27/72 主分类号 G02B5/02
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