发明名称 Method for the treatment of substrates, substrate and treatment device for carrying out said method
摘要 In a method for the treatment of substrates (13) for solar cells composed of silicon, after multiple etching the substrates are cleaned (18) with DI water. Afterwards, the substrates (13) are dried and heated in drying stations (22, 25). The heated substrates (13) are subsequently oxidized in an oxidation station (30) by means of oxidation gas (34) with a proportion of ozone.
申请公布号 KR101272818(B1) 申请公布日期 2013.06.10
申请号 KR20117005825 申请日期 2009.09.10
申请人 发明人
分类号 H01L21/302;H01L31/042;H01L31/18 主分类号 H01L21/302
代理机构 代理人
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