发明名称 APPARATUS FOR PROCESSING SUBSTRATE
摘要 <p>PURPOSE: A substrate processing apparatus is provided to constantly supply a wafer to different process module when one process module is out of order, and to improve productivity. CONSTITUTION: A load port(110) includes a container(111) for receiving a wafer(10). A process module includes a process unit(131,133) for treating the wafer and a wafer transfer part(135) for moving the wafer. The process module comprises a first process module(130) and a second process module. An index(120) temporarily accommodates the processed wafer. A control unit(150) controls the wafer transfer part to move the wafer of the load port to a process module. [Reference numerals] (150) Control unit; (160) User interface</p>
申请公布号 KR20130060815(A) 申请公布日期 2013.06.10
申请号 KR20110127080 申请日期 2011.11.30
申请人 SEMES CO., LTD. 发明人 KANG, HO SHIN;KIM, HYO JEUNG
分类号 H01L21/677;B65G49/07;H01L21/02 主分类号 H01L21/677
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