| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a curable composition from which a mold can be released simply in a short time after photo-curing with a small release force, and to provide a patterning method requiring a small release force. <P>SOLUTION: The curable composition has a polymerizable monomer and a polymerization initiator. The polymerization initiator initiates polymerization of the polymerizable monomer, and the curable composition is cured when the polymerizable monomer is polymerized. The curable composition also has a gas generation agent which generates gas by receiving a pressure. <P>COPYRIGHT: (C)2013,JPO&INPIT |
