| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a substrate cleaning device and a substrate cleaning method for cleaning the back surface of a substrate, which can also clean cleaning means for cleaning the back surface of a substrate and substrate holding means for holding a substrate. <P>SOLUTION: The substrate cleaning device for cleaning the back surface of a substrate includes first substrate holding means for holding a substrate by coming into contact with a first region of the back surface, second substrate holding means for holding the substrate by coming into contact with a second region of the back surface other than the first region, first cleaning means for cleaning the back surface of a substrate held by the first substrate holding means or the second substrate holding means, and second cleaning means for cleaning the contact surface of the second substrate holding means coming into contact with the substrate. <P>COPYRIGHT: (C)2013,JPO&INPIT |
