发明名称 METHOD FOR DETECTING CRACK OF SUBSTRATE, AND METHOD FOR OPERATING ION BEAM IRRADIATION DEVICE BASED ON METHOD FOR DETECTING CRACK OF SUBSTRATE
摘要 <P>PROBLEM TO BE SOLVED: To inexpensively detect crack of a substrate over a wide range with a simple structure in an ion beam irradiation device. <P>SOLUTION: An ion beam irradiation device 1 comprises: a substrate support member 9 which has one or more openings on a face opposing to a rear face of a substrate 8; a substrate drive mechanism which drives the substrate support member 9 having the substrate 8 mounted thereon, and transfers the substrate 8 to an irradiated region in which the substrate 8 is irradiated with at least some of ion beams 3 and to a non-irradiated region in which the substrate 8 is not irradiated with the ion beams 3; and a beam current measuring instrument 11 arranged at a position to be irradiated with the ion beams 3 on the downstream side of the substrate 8. The ion beam irradiation device 1 detects the presence or absence of the crack of the substrate based on a measured value of the beam current measured by the beam current measuring instrument 11 when the substrate 8 is transferred into the irradiated region. <P>COPYRIGHT: (C)2013,JPO&INPIT
申请公布号 JP2013115209(A) 申请公布日期 2013.06.10
申请号 JP20110259437 申请日期 2011.11.28
申请人 NISSIN ION EQUIPMENT CO LTD;ULVAC JAPAN LTD 发明人 UNE HIDEYASU;TANAKA KOHEI;KAWAKAMI NAOYUKI
分类号 H01L21/265;H01J37/317;H01L21/683 主分类号 H01L21/265
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