| 摘要 |
<P>PROBLEM TO BE SOLVED: To uniform the thickness of a thin film formed on a processed substrate. <P>SOLUTION: The thin film forming method for forming the thin film on a film formation surface 12 of the processed substrate 10 includes a step for measuring the distribution of gas wind velocity in a height position S of the film formation surface 12 of fine particle gas sprayed from a plurality of two-fluid spray nozzles 22A-22E, and a step for arranging the two-fluid spray nozzles 22A-22E so that spaces L1-L4 between the adjacent two-fluid spray nozzles 22A-22E have the prescribed values. The spaces L1-L4 are set to the prescribed values so that the thickness of the thin film is uniform based on the distribution of the gas wind velocity of the fine particle gas sprayed from the two-fluid spray nozzles 22A-22E. <P>COPYRIGHT: (C)2013,JPO&INPIT |
