发明名称 PVD APPARATUS AND METHOD WITH DEPOSITION CHAMBER HAVING MULTIPLE TARGETS AND MAGNETS
摘要 PURPOSE: A PVD apparatus having targets and magnets formed in a deposition chamber and a method are provided to improve uniformity by depositing different materials on a substrate. CONSTITUTION: A target device includes a target assembly(4). The target assembly includes a target member and a magnet(16). The target assembly has a controllable power source. A stage accommodates a workpiece. The target assembly includes a ring-shaped target member.
申请公布号 KR20130061030(A) 申请公布日期 2013.06.10
申请号 KR20120012482 申请日期 2012.02.07
申请人 TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD. 发明人 KAO CHUNG EN;TSAI MING CHIN;CHOU YOU HUA;CHIANG CHEN CHIA;LEE CHIH TSUNG;KUO MING SHIOU
分类号 H01L21/203 主分类号 H01L21/203
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