| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an inexpensive spectroscope capable of eliminating necessity of troublesome adjustment, having high wavelength reproducibility and capable of easily monitoring whether a plasma emission state in an etching device is normal or not. <P>SOLUTION: A fixed type slit part 3 having a plurality of slits corresponding to diffracted beams diffracted by a fixed type diffraction grating 30 is installed, a mask capable of transmitting only a diffracted light of a specific wavelength is arranged on the incident side front of the slit part 3 and a detector having a size capable of detecting all the plurality of diffracted beams is installed. Since a zero-order light detector for detecting zero-order light reflected by the diffraction grating is installed, a plasma emission state can be monitored from a signal output of the acquired zero-order light by utilizing a property that the signal output of the zero-order light corresponds to the plasma emission state. <P>COPYRIGHT: (C)2013,JPO&INPIT |
